Monolayer Graphene On Sio2/si Substrate, Size: 2"
Selling Price:
USD 295 / Piece
Minimum Order Quantity:
1 Piece
Shipment Delivery Time:
3-4 weeks
Shipment Port:
Istanbul
Currency Options:
USD
Language Support:
English, Turkish
Certification:
Inquire
Production Capacity: 1000 kg Piece
Primary Business:
Manufacturer
Packaging:
Box
Preferred Payment Method:
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Monolayer Graphene On SiO2/Si Substrate, Size: 2" Details
Technical Properties of Graphene Film: |
|
| Transparency | > 95 % |
| Coverage: | > 93% |
| Thickness (theoretical) | 0.340 nm |
| Sheet Resistance: | 500-530 Ohms/sq |
| Grain size | 6-10 μm |
Technical Properties of SiO2/Si Substrate: |
|
| Size (inch) | 2'' |
| Dry Oxide Thickness | 300 nm |
| Type | Phosphor doped/N type |
| Orientation | <100> |
| Resistivity | 0.001 - 0.01 |
| Thickness | 525 +/- 20 μm |
| Front surface | One Side Polished |
Applications:
Graphene research; Supercapacitors; Catalyst; Solar energy; Graphene optoelectronics, plasmonics and nanophotonics;
Graphene semiconductor chips; Conductive graphene film; Graphene computer memory; Biomaterials and Bioelectronics
SEM Image of Monolayer Graphene
Raman Image Of Monolayer Graphene
METHOD OF PREPARATION GRAPHENE ON SI/SIO2 SUBSTRATE WAS PREPARED BY THE FOLLOWING STEPS: |
| 1) Singlelayer graphene grown on copper foil |
| 2) Deposit PMMA and curing process |
| 3) Remove Cu by etching process |
| 4) Wash PMMA/Graphene in DI water |
| 5) Redeposit PMMA/Graphene onto Si substrate and curing process |
|
6) Remove PMMA with aceton |
About Nanographenex Nanotechnology Ltd
Business Type:
Manufacturer
Country / Region:
Istanbul, Turkey
Main Products: Nanographene...
Total Annual Revenue:
Not Provided
Year of Establishment:
Not Provided
Business Nature
Manufacturer
Country/Region
Istanbul, Turkey
Main Products
Nanographene...
Payment Terms
Bank wire (T/T)
About Nanographenex Nanotechnology Ltd
Nanographenex Nanotechnology Ltd
